Advantage:
  Comprehensive safety consideration.Safety interlocks including flow,
  Temperature,pressure,and leak sensors.
  Long PM cycles and short PM working time. Long maintenance cycle and short
  maintenance duration (0.5-1.0 hrs) ensuring minimum process down time.
  Pre-heated functionality for drain in gases to enhance the processing efficiency.
  Special cooling design to prevent powder from accumulatiing.
  High anti-corrosion design.
  SEMI S2 related certificate by ITRI (Industrial Technology Research Institute)
  100% parts stock support in local Technical support local directly
A Thermal Wet Scrubber is a system for treating process waste gases.
 Combining thermal oxidization, decomposition and water resolution,
 process gasses are reacted into powders or soluble matters in the water
 using a specially designed reaction chamber.
 After a post-stage thorough and effective treatment, the water is then
dis...ged into the plant draining system. The scrubber is capable of
treating special gases used by semiconductor manufacturers, LED
 makers and solar-energy plants.
1.薄膜型太陽能電池工廠人氣設備…PECVD製程…SiH4,GeH4,H2,NH3等氣體:
處理流量:3000LPM(氫氣氛圍)
處理流程:電熱+CDA+氣波去塵濾袋+SiO2回收槽 (可無水處理)
2.LED工廠MOCVD製程專用設備…LED製程…H2,NH3,MO等氣體:
處理流量:1400LPM~1800LPM(以氫氣換算H2:NH3=1.5:1)
處理流程:電熱+熱交換器+冷卻水(可無水處理)
Thermal-Wet type scrubber can remove harmful gases from process which through high temperature heating dissociation and the following water sparying.The scrubbers are especially suitable for PFC gases with low fluorine in Semiconductor,LED,Solar and MEMS field.The scrubbers have advantages such as larger capacity,high efficiency,long operation life,low electric consumption,operate safety and easy to maintenance etc.
Thermal-Wet 電熱水洗式系列尾氣處理設備,透過先高溫加熱解離,再噴淋水洗的方式去除製程中產生的有害廢氣,特別適用於含低氟PFC氣體的半導體,面板,LED,太陽能,MES等領域.該系列設備具有處理量大,效率高,壽命長,能耗小,操作安全,易維護等優點
電熱水洗式廢氣處理機為一臺專門處理各種製程廢氣的系統，它混合了熱氧化分解及水溶解的過程，將製程所產生的廢氣，利用特殊設計的一個反應室，反應成粉末或是反應成溶解於水中的物質，再經過後段之完全有效處理才排放至廠務中央處理系統，所處理的廢氣，包含半導體廠、 TFT-LCD 廠、LED廠、太陽能廠 …等所使用的特殊氣體。

User friendly interface.Intelligent electronic control system
Intelligent on-line troubleshooting system
High Powder capture efficiency

Operation temperature 650~850°C for effective waste-gas treatment
Water saving function
Ventrui’s tube design(ECS-2100S)
N2 flash arrester，keep safety(Option)
Installation of remove moisture
Cost effective.Low cost and Lowest cost of operation.

Flexible customer design service
Larger capacity could apply  to process with heavy H2or SiH4
Approved by SEMI S2
Long residence time – toxic gas process upon utility time
Water saving function
Comprehensive safety consideration
Inlet N2 & air preheating
Friendly user interface
Flexible customer design service
100% parts stock support in local
Tech. support local directly
Safety interlocks including flow,temperature,pressure,and leak sensors.
Specifications and performance have been specifically designed for use with LP-CVD processes.
Minimum footprint and height.
Special air currents increase heat transmission, accelerating the gas abatement rate.
Minimal initial costs.
Simple disassembly of key parts ensures high maintenance performance.
SEMI standard certification .
Heater housing and reactor corrosion prevention
Stable temperature control of reactor parts
NOx and CO emissions reductions
Supply of CDA for oxidizing reaction
Ultra precision safety mechanism with on-line signal points furnished at critical locations within the plant.
Humanized design of machine operation for the protection of relevant operators as well as for safety and convenience.
Patented water curtain reaction chamber enabling prevention against clogging and erosion in the chamber by the power dust.
Simple disassembly of key parts ensures high maintenance performance.
Response PFC processing Hydrogen(LNG,LPG)injection 、PH&NaOH Control System 、Power drain system.(Option)
Thermal-wet type or Thermal -cooling type(PCW cooling)
SiC heaters with Inconel housing for 850°C operation
Natural (gravity) drain standard / pump drain (option)
pH adjust : NaOH injection (option)
Stable reactor temperature for high abatement efficiency

The inlet head is able to connect up to more channels of gas which is from different process isolated by encircling nitrogen.The process gas are going through an 650~900 degree C high temperature chamber with special material which be able to be harmless or souble gas.
專利混合桶設計,可一次分接至多路混合氣體,經氮氣環繞裝置隔離的不同製程廢氣,透過600~900度C高溫的特殊材質腔體,解離或氧化製成無害或可溶性氣體
The chamber with water curtain can resist the chamber coorsion by strong acid and alkaline gas and capture a large amount of powder to prevent pipe clogging.
加熱腔體獨家專利水幕設計,可高效阻擋氣體解離後產生的強酸鹼性氣體對腔體的腐蝕,並可補獲反應產生的大量粉塵,預防管路堵塞
The trp-section washing spray drive can remove acid-base,powder and residual water soluble gas which to promote the DRE and reduce pipe corrosion and clogging.
三道水洗裝置進一步去除氣體高溫解離後產生的酸鹼,粉塵和殘餘水溶性氣體,提升處理效率,降低管路阻塞和腐蝕
 專利水槽設計,可過濾槽內粉塵,實現清洗水循環使用,降低設備用水量
The exclusive tank design can filter the powder which in the tank to achieve water recycle using reduce water consumption.
專利水槽設計,可過濾槽內粉塵,實現清洗水循環使用,降低設備用水量
Option：Exhaust Blower出口端鼓風機、Extension LCD Monitor Controller、Auto By Pass System 自動切換系統、Preheat Gun加熱槍、Heating Jacket加熱帶 、 Special air currents increase heat transmission, accelerating the gas abatement rate.PH Meter System 、  自動加藥設計、中央遠端監控系統、氣體偵測器、Blower supply及 水質酸鹼測量供應系統
適用於半導體CVD,Etch,Diffusion等製程
對應大風量,高粉塵負荷製程
操作容易,低操作成本
維護保養便捷,時間短(0.5~1小時)
加熱爐簡單更換
結合電熱式及溼式系統於單一機台中
粉塵補捉效率高
水溫偵測感應系統。
低耗水量之專利設計。
智慧型電子控制系統。
設有雙馬達排水系統。
作業溫度 850 度，有效處理廢氣。
智慧型線上故障排除系統。
超精密之安全機制在機台各個重點位置皆有安裝即時 ON-Line 訊號點。
人性化機台之操作設計保護相關工作人員之安全性及便利性。
獨特設計之水幕式反應腔體，可避免腔體粉塵阻塞及腐蝕。
保養維護的週期長，定期巡檢的時間約 0.5~1小時，不影響製程。   
水氣分離設計
利用綠色能源電能的無水處理全過程(Option)
熱氧化分解處理NH3,無需再進行水處理
H2,MO也能完全氧化分解
無需燃料配管,初期設置成本低
無需燃料供應,運行成本相對低
充分利用反應熱能之節能設計,實現運行成本降低
利用熱交換放熱的設計,實現總排氣量的減少
設備整體構造簡單,容易維護
運用獨有的電熱器技術,實現NOx產生量的減少
CO2零排放,實現超低碳環保.

電控系統Interlock精密安全設計:高精度PLC邏輯編程系統;簡潔的電路佈局,方便故障排除;電機電子皆經嚴格品質管控;風冷系統,自動保持適當工作溫度
遠程LCD人機操作界面:人性化設計,操作簡便;中/英文介面顯示;實時的警報訊息;報警記錄;在線警報排除;維修保養菜單,方便維護
周延的安全考量,操作容易,多種感測器及異常感測器, 操作上更安全及安心
PM週期長,且因以前門服務為主,PM時間短
Idle Model省水省電省氣模式設計降低運轉成本
循環水設計,耗水量低
自動控制排水系統
優於國內外同業的零件品質,耗材成本最低
自動Bypass設計(Option)
客製化服務
零件供應充足
到廠技術服務
Option:自動加藥設計,中央監控系統,氣體偵測器
MTBF>7300 Hours
MTTR<1 Hour
SEMI S2認證
Capacity:200LPM~4000LPM可客製化設計